반도체
RPS
RPS(Remote Plasma Source) is a remote high density plasma device that supply radical, in order to clean the silicone which cumulated after metalizing semiconductor inside of the chamber. RPS Block provides plasma and NF3 gas to semiconductor, which requires anti-plasma, wear resistance, and hardness. PEO coating minimize particle creation by anti-plasma. It leads to high productivity and reliability
Heater
Heater repeatedly expose to high temperature plasma gas condition. Continuing cleansing and deposition process cause corrosion which is pollution source for particle.
Due to the features of high durability, anti-plasma, and adhesion, PEO coating able to resist more than 400 degree without crack.
Electrode
Adonizing treated showerhead parts may cause distortion and separation in short period of process. It also creates particle issues in high temperature deposition process, due to coefficient of expansion. PEO coating is a stable plasm ceramic coating method that cement to raw materials. High anti-plasma provides reliability by minimizing particle creation
